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020 _a9781789451870
020 _a9781394352029
_qelectronic book
020 _a1394352026
_qelectronic book
020 _a9781394352005
_qelectronic book
020 _a139435200X
_qelectronic book
020 _z9781789451870
_qhardcover
024 7 _a10.1002/9781394352029
_2doi
035 _a(OCoLC)1490408001
_z(OCoLC)1483705051
_z(OCoLC)1484884447
035 9 _a(OCLCCM-Owned)1490408001
040 _aSFB
_beng
_erda
_epn
_cSFB
_dDG1
_dOCLCO
_dCLOUD
_dYDX
_dOCLCO
041 _aeng
049 _aMAIN
050 4 _aQC481
_b.A53 2025
100 1 _aAndré, Jean Michel,
_eauthor.
_0http://id.loc.gov/authorities/names/n50025239
245 1 0 _aX-ray radiation and artificial Bragg structures /
_ccoordinated by Jean-Michel André, Philippe Jonnard.
264 1 _aLondon, UK :
_bISTE Ltd ;
_aHoboken, NJ :
_bJohn Wiley & Sons, Incorporated,
_c2025.
264 4 _c©2025
300 _a1 online resource (vii, 261 pages) :
_bcolor illustrations.
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
490 0 _aSciences, Waves, X-ray
504 _aIncludes bibliographical references and index.
520 _aThe artificial Bragg structures (ABS) studied in this book have revolutionized X-ray optics. They are based on (quasi-) periodic stacks of nanoscale thin films with periods close to the wavelength of the radiation. X-ray Radiation and Artificial Bragg Structures presents the historical prolegomena relating to X-ray sources and the initial development of ABS. It analyzes the modeling of ABS characteristics and performance, and their optimization. It also presents matrix and recursive methods, coupled-wave theory and scattering theory. This book also examines ABSs as seats for special quantum and magneto-optic phenomena. It discusses the application of ABSs, as well as promising developments in EUV lithography and the realization of new X-ray sources. Finally, it presents the prospects offered by ABSs in the near future, particularly in the field of coherent sources and X-ray lasers.
588 _aDescription based on online resource; title from digital title page (viewed on March 20, 2025).
650 0 _aX-rays.
_0http://id.loc.gov/authorities/subjects/sh85148749
650 0 _aExtreme ultraviolet lithography.
_0http://id.loc.gov/authorities/subjects/sh2009000606
650 0 _aX-ray lasers.
_0http://id.loc.gov/authorities/subjects/sh86000672
650 6 _aRayons X.
650 6 _aLithographie par ultraviolets extrêmes.
650 6 _aLasers à rayons X.
650 7 _ax-ray (radiation)
_2aat
650 7 _aSpectroscopy & Spectrum Analysis.
_2bisacsh/2023
650 7 _aImaging Systems.
_2bisacsh/2023
650 7 _aTECHNOLOGY & ENGINEERING.
_2bisacsh/2023
650 7 _aSCIENCE.
_2bisacsh/2023
655 0 _aElectronic books.
700 1 _aJonnard, Philippe,
_eauthor.
776 0 8 _z9781789451870
776 0 8 _z1789451876
856 4 0 _uhttps://onlinelibrary.wiley.com/doi/book/10.1002/9781394352029
_yFull text is available at Wiley Online Library. Click here to view.
942 _2ddc
_cER