The physics of SiO₂ and its interfaces :  proceedings of the International Topical Conference on the Physics of Si0₂ and Its Interfaces, held at the IBM Thomas J. Watson Research Center, Yorktown Heights, New York, March 22-24, 1978 / 
editor, Sokrates T. Pantelides. 
 - xi, 488 pages :  illustrations ;  27 cm. 
<br/><br/>Includes bibliographical references and index. 
<br/><br/><label>ISBN: </label>0080230490 9780080230498 
<br/><br/><label>LCCN: </label>78018205  
<br/><br/><label>Subjects--Topical Terms: </label><br/>Silica--Congresses.<br/>Surfaces (Physics)--Congresses.<br/>Surface chemistry--Congresses.
<br/><br/><label>LC Class. No.: </label>QC585.75.S55  / I57 1978 
<br/><br/><label>Dewey Class. No.: </label>546/.683/2