Advanced nanoscale MOSFET architectures : (Record no. 96052)

000 -LEADER
fixed length control field 08545cam a22006978i 4500
001 - CONTROL NUMBER
control field 14168148
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20260710110437.0
006 - FIXED-LENGTH DATA ELEMENTS--ADDITIONAL MATERIAL CHARACTERISTICS--GENERAL INFORMATION
fixed length control field m o d
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr |||||||||||
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 241016s2024 nju o 001 0 eng
010 ## - LIBRARY OF CONGRESS CONTROL NUMBER
LC control number 2024044708
015 ## - NATIONAL BIBLIOGRAPHY NUMBER
National bibliography number GBC489594
Source bnb
016 7# - NATIONAL BIBLIOGRAPHIC AGENCY CONTROL NUMBER
Record control number 300209714
Source Uk
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781394188949
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781394188956
Qualifying information (epub)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 1394188951
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781394188987
Qualifying information (adobe pdf)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 1394188986
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
Cancelled/invalid ISBN 9781394188949
Qualifying information (hardback)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781394188970
Qualifying information (electronic bk. : oBook)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 1394188978
Qualifying information (electronic bk. : oBook)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
Cancelled/invalid ISBN 1394188943
Qualifying information hardcover
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1002/9781394188970
Source of number or code doi
024 8# - OTHER STANDARD IDENTIFIER
Standard number or code CIPO000096019
035 ## - SYSTEM CONTROL NUMBER
System control number (OCoLC)1478248921
Canceled/invalid control number (OCoLC)1435948193
-- (OCoLC)1442067096
-- (OCoLC)1517987817
035 #9 - SYSTEM CONTROL NUMBER
System control number (OCLCCM-Owned)1478248921
041 ## - LANGUAGE CODE
Language code of text/sound track or separate title eng
042 ## - AUTHENTICATION CODE
Authentication code pcc
049 ## - LOCAL HOLDINGS (OCLC)
Holding library MAIN
050 00 - LIBRARY OF CONGRESS CALL NUMBER
Classification number TK7871.95
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC
Subject category code subdivision 027000
Source bisacsh
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC
Subject category code subdivision 008090
Source bisacsh
072 #7 - SUBJECT CATEGORY CODE
Subject category code TG
Source bicssc
245 00 - TITLE STATEMENT
Title Advanced nanoscale MOSFET architectures :
Remainder of title current trends and future perspectives /
Statement of responsibility, etc edited by Kalyan Biswas, Angsuman Sarkar.
263 ## - PROJECTED PUBLICATION DATE
Projected publication date 2501
264 #1 - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication, distribution, etc Hoboken, New Jersey :
Name of publisher, distributor, etc Wiley,
Date of publication, distribution, etc [2024]
300 ## - PHYSICAL DESCRIPTION
Extent 1 online resource
336 ## - CONTENT TYPE
Content type term text
Content type code txt
Source rdacontent
337 ## - MEDIA TYPE
Media type term computer
Media type code c
Source rdamedia
338 ## - CARRIER TYPE
Carrier type term online resource
Carrier type code cr
Source rdacarrier
500 ## - GENERAL NOTE
General note Includes index.
505 0# - CONTENTS
Formatted contents note About the Editors -- List of Contributors -- Preface -- Acknowledgments -- 1 Emerging MOSFET Technologies 1 Kalyan Biswas and Angsuman Sarkar -- 1.1 Introduction: Transistor Action -- 1.2 MOSFET Scaling -- 1.3 Challenges in Scaling the MOSFET -- 1.4 Emerging MOSFET Architectures -- 1.4.5 Graphene FET -- 1.4.6 III-V Material-based MOSFETS -- 1.4.7 HEMT -- 1.4.8 Strain Engineered MOSFETs -- 1.5 Organization of this Book -- 2 MOSFET: Device Physics and Operation 15 Ruthramurthy Balachandran, Savitesh M. Sharma, and Avtar Singh -- 2.1 Introduction to MOSFET -- 2.2 Advantages of MOSFET -- 2.3 Applications of MOSFETs -- 2.4 Types of MOSFETs -- 2.5 Band Diagram of MOSFET -- 2.6 MOSFET Regions of Operation -- 2.7 Scaling of MOSFET -- 2.8 Short-channel Effects -- 2.9 Body Bias Effect -- 2.10 Advancement of MOSFET Structures -- 3 High-K Dielectrics in Next Generation VLSI/Mixed Signal Circuits 47 Asutosh Srivastava -- 3.1 Introduction to Gate Dielectrics -- 3.2 High-K Dielectrics in Metal-Oxide-Semiconductor Capacitors -- 3.3 High-K Dielectrics in Metal Insulator Metal (MIM) Capacitors -- 3.4 MOSFETs Scaling and the Need of High-K -- 3.5 High-K Dielectrics in Next Generation Transistors -- 4 Consequential Effects of Trap Charges on Dielectric Defects for MU-G FET 61 Annada S. Lenka and Prasanna K. Sahu -- 4.1 Introduction -- 4.2 TID Effects Overview -- 4.3 Application Area of Device for TID Effect Analysis -- 4.4 Near the Earth: Trapped Radiation -- 4.5 Ionizing Radiation Effect in Silicon Dioxide (SiO2) -- 4.6 TID Effects in CMOS -- 4.7 TID Effects in Bipolar Devices -- 4.8 Understanding and Modeling a-SiO2 Physics -- 4.9 Hydrogen (H2) Reaction with Trapped Charges at Insulator -- 4.10 Pre-Existing Trap Density and their Respective Location -- 4.11 Use of High-K Dielectric in MU-G FET -- 4.12 Properties of Trap in the High-K with Interfacial Layer -- 4.13 Trap Extraction Techniques -- 4.14 Conclusion -- 5 Strain Engineering for Highly Scaled MOSFETs 85 Chinmay K. Maiti, Taraprasanna Dash, Jhansirani Jena, and Eleena Mohapatra -- 5.1 Introduction -- 5.2 Simulation Approach -- 5.3 Case Study -- 5.4 Conclusions -- 6 TCAD Analysis of Linearity Performance on Modified Ferroelectric Layer in FET Device with Spacer 113 Yash Pathak, Kajal Verma, Bansi Dhar Malhotra, and Rishu Chaujar -- 6.1 Introduction -- 6.2 Simulation and Structure of Device -- 6.3 Results and Analysis -- 6.4 Conclusion -- 7 Electrically Doped Nano Devices: A First Principle Paradigm 125 Debarati D. Roy, Pradipta Roy, and Debashis -- 7.1 Introduction -- 7.2 Electrical Doping -- 7.3 First Principle -- 7.4 Molecular Simulation -- 7.5 Conclusion -- 8 Tunnel FET: Principles and Operations 143 Zahra Ahangari -- 8.1 Introduction to Quantum Mechanics and Principles of Tunneling -- 8.2 Tunnel Field-Effect Transistor -- 8.3 Challenges of Tunnel Field-Effect Transistor -- 8.4 Techniques for Improving Electrical Performance of Tunnel Field-Effect Transistor -- 8.5 Conclusion -- 9 GaN Devices for Optoelectronics Applications 175 Nagarajan Mohankumar and Girish S. Mishra -- 9.1 Introduction -- 9.2 Properties of GaN-Based Material -- 9.3 GaN LEDs -- 9.4 GaN Lasers -- 9.5 GaN HEMTs for Optoelectronics -- 9.6 GaN Sensors -- 10 First Principles Theoretical Design on Graphene-Based Field-Effect Transistors 201 Yoshitaka Fujimoto -- 10.1 Introduction -- 10.2 Graphene -- 10.3 Graphene/h-BN Hybrid Structure -- 10.4 Conclusions -- 11 Performance Analysis of Nanosheet Transistors for Analog ICs 221 Yogendra P. Pundir, Arvind Bisht, and Pankaj K. Pal -- 11.1 Introduction -- 11.2 Evolution of Nanosheet Transistors -- 11.3 TCAD Modeling of Nanosheet Transistor -- 11.4 Transistor's Analog Performance Parameters -- 11.5 Challenges and Perspectives of Modern Analog Design -- 12 Low-Power Analog Amplifier Design using MOS Transistor in the Weak Inversion Mode 255 Soumya Pandit and Koyel Mukherjee -- 12.1 Introduction -- 12.2 Review of the Theory ofWeak Inversion Mode Operation of MOS Transistor -- 12.3 Design Steps for Transistor Sizing Using the IC -- 12.4 Design Examples -- 12.5 Summary -- 13 Ultra-conductive Junctionless Tunnel Field-effect Transistor-based Biosensor with Negative Capacitance 281 Palasri Dhar, Soumik Poddar, and Sunipa Roy -- 13.1 Introduction -- 13.2 Importance of SS and ION/IOFF in Biosensing -- 13.3 Importance of Dopingless Source and Drain in High Conductivity -- 13.4 Relation of Negative Capacitance with Non-hysteresis and Effect on Biosensing -- 13.5 Variation of Source Material on Biosensing -- 13.6 Importance of Dual Gate and Ferroelectricity on Biosensing -- 13.7 Effect of Dual Material Gate on Biosensing -- 14 Conclusion and Future Perspectives 301 Kalyan Biswas and Angsuman Sarkar -- 14.1 Applications -- 14.2 Some Recent Developments -- 14.3 Future Perspectives -- 14.4 Conclusion -- References -- Index.
520 ## - SUMMARY, ETC.
Summary, etc "Modern life has been revolutionized by the advancements in Complementary Metal Oxide Semiconductor (CMOS) technology. The performance of MOSFET has improved dramatically via gate length scaling since its invention. In order to serve the next generation high performance requirements with lower operating power, remorseless scaling of CMOS technology has now reached to the atomic scale dimensions. Conventional MOSFET scaling not only involves the reduction of device size but also requires a reduction in the transistor supply voltage (VDD). With the reduction of VDD, the threshold voltage (Vth) must be scaled down simultaneously in order to attain reasonable ON-state current, reduce delay and to maintain sufficient gate overdrive voltage. As a consequence of device scaling following Moore's law, every year the channel length of the MOSFET is reducing, causing Short Channel Effect (SCEs). Different strategies have been considered to surmount SCEs using different device architectures and material compositions."--
Assigning source Provided by publisher.
588 ## - SOURCE OF DESCRIPTION NOTE
Source of description note Description based on print version record and CIP data provided by publisher; resource not viewed.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Metal oxide semiconductor field-effect transistors.
Authority record control number http://id.loc.gov/authorities/subjects/sh85084065
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Nanotechnology.
Authority record control number http://id.loc.gov/authorities/subjects/sh91001490
650 #6 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Transistors MOSFET.
650 #6 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Nanotechnologie.
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Nanotechnology & MEMS.
Source of heading or term bisacsh/2024
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Semiconductors.
Source of heading or term bisacsh/2024
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Electronics.
Source of heading or term bisacsh/2024
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element TECHNOLOGY & ENGINEERING.
Source of heading or term bisacsh/2024
655 #0 - INDEX TERM--GENRE/FORM
Genre/form data or focus term Electronic books.
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Biswas, Kalyan,
Relator term editor.
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Sarkar, Angsuman,
Relator term editor.
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Display text Print version:
Title Advanced nanoscale MOSFET architectures
Place, publisher, and date of publication Hoboken, New Jersey : Wiley, [2024]
International Standard Book Number 9781394188949
Record control number (DLC) 2024044707
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Display text Print version :
International Standard Book Number 9781394188949
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier https://onlinelibrary.wiley.com/doi/book/10.1002/9781394188970
Link text Full text is available at Wiley Online Library. Click here to view.
942 ## - ADDED ENTRY ELEMENTS
Source of classification or shelving scheme
Item type EBOOK
Holdings
Withdrawn status Lost status Source of classification or shelving scheme Damaged status Use restrictions Not for loan Permanent Location Current Location Date acquired Date last seen Price effective from Item type
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